Menu
Search
Filters
Close
Menu

Save 20% on select titles with code HIDDEN24 - Shop The Sale Now

99275 High Temperature Corrosion of Silicon Based Ceramics in Environments Containing Halogens and Alkali Halides

Picture for 99275 High Temperature Corrosion of Silicon Based
Available for download
Product Number: 51300-99275-SG
ISBN: 99275 1999 CP
Author: Michael McNallan
$0.00
$20.00
$20.00
Silicon carbide and other silicon-based ceramics obtain their oxidation resistance by the formation of protective silica films in oxygen containing environments. In the presence of chlorine or alkali chlorides, this film may not form, or may be unprotective, so that accelerated oxidation occurs. Chlorine and alkali halides may contribute to accelerated oxidation via three possible mechanisms. Active oxidation occurs at relatively low temperatures and high ratios of chlorine to oxygen, and is characterized by simultaneous formation of silicon chlorides and non-protective oxides. Silica film disruption occurs at higher temperatures when volatile chlorides format the interface between SiC and the SiO2 scale, and cause bubbles to form in the film. Alkali fluxing occurs in the presence of alkali chloride vapors. In alkali fluxing, a low melting glass is formed by the reaction between the alkali vapor species and silica rather than by reactions with chlorine itself.
Silicon carbide and other silicon-based ceramics obtain their oxidation resistance by the formation of protective silica films in oxygen containing environments. In the presence of chlorine or alkali chlorides, this film may not form, or may be unprotective, so that accelerated oxidation occurs. Chlorine and alkali halides may contribute to accelerated oxidation via three possible mechanisms. Active oxidation occurs at relatively low temperatures and high ratios of chlorine to oxygen, and is characterized by simultaneous formation of silicon chlorides and non-protective oxides. Silica film disruption occurs at higher temperatures when volatile chlorides format the interface between SiC and the SiO2 scale, and cause bubbles to form in the film. Alkali fluxing occurs in the presence of alkali chloride vapors. In alkali fluxing, a low melting glass is formed by the reaction between the alkali vapor species and silica rather than by reactions with chlorine itself.
PRICE BREAKS - The more you buy, the more you save
Quantity
1+
5+
Price
$20.00
$20.00
Product tags
Also Purchased
Picture for 99273 ADVANCED CERAMICS FOR HIGH-TEMPERATURE
Available for download

99273 ADVANCED CERAMICS FOR HIGH-TEMPERATURE SERVICE

Product Number: 51300-99273-SG
ISBN: 99273 1999 CP
Author: David W. Richerson, D.A. Haught
$20.00
Picture for 10202 Alkali Sulfate-Induced Hot Corrosion Resistance of Various Heat-Resistant Alloys
Available for download

10202 Alkali Sulfate-Induced Hot Corrosion Resistance of Various Heat-Resistant Alloys

Product Number: 51300-10202-SG
ISBN: 10202 2010 CP
Author: Vinay P. Deodeshmukh and Lee M. Pike
Publication Date: 2010
$20.00
Picture for 99270 EFFECT OF QUATERNARY ELEMENT ADDITION
Available for download

99270 EFFECT OF QUATERNARY ELEMENT ADDITION ON THE OXIDATION BEHAVIOUR OF Ti3Al-Nb INTERMETALLICS

Product Number: 51300-99270-SG
ISBN: 99270 1999 CP
Author: S.K Jha and Ml. Khanna
$20.00
Categories
Industry
Recently viewed
Popular tags
View all

Association for Materials Protection and Performance

© AMPP All Rights Reserved.
Membership Terms of Content Use
Contact Customer Support