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08372 Electrochemical Studies with CMAS Probes on Corrosion Inhibition of Copper and Affected Metals in the Presence of Ammonia and Other Corrosive Ions in Zero Liquid Discharge Cooling Water

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  • 08372 Electrochemical Studies with CMAS Probes on Corrosion Inhibition of Copper and Affected Metals in the Presence of Ammonia and Other Corrosive Ions in Zero Liquid Discharge Cooling Water
Picture for 08372 Electrochemical Studies with CMAS Probes on Corrosion Inhibition of Copper and Affected Metals
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Product Number: 51300-08372-SG
ISBN: 08372 2008 CP
Author: Dan Duke
Publication Date: 2008
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Studies were performed with coupled multielectrode array sensors (CMAS) to establish the corrosion inhibition performance of azoles corrosion inhibitors for copper and metals normally corroded by the presence of ammonia. The studies were conducted with water at high pH and high total dissolved solids (TDS) that result from the operation of an evaporative cooling tower system at zero liquid discharge (ZLD). The study compares the effect of tolytriazole treated versus untreated water with chemistry at pH 10, low hardness (<100 mg/L as CaCO3) and TDS of 150,000 mg/L along with the presence of silica corrosion inhibitor generated from source water.
Studies were performed with coupled multielectrode array sensors (CMAS) to establish the corrosion inhibition performance of azoles corrosion inhibitors for copper and metals normally corroded by the presence of ammonia. The studies were conducted with water at high pH and high total dissolved solids (TDS) that result from the operation of an evaporative cooling tower system at zero liquid discharge (ZLD). The study compares the effect of tolytriazole treated versus untreated water with chemistry at pH 10, low hardness (<100 mg/L as CaCO3) and TDS of 150,000 mg/L along with the presence of silica corrosion inhibitor generated from source water.
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